These series machines are equipped with rinsing, double-side brushing, megasonic cleaning, N2 drying, high-speed spin-drying functions.
PLC system, touch screen control, one-button automatic brushing and cleaning, the in-line type machine is equipped with fully-automatic loading and unloading system, “cassette to cassette”is more convenient.
Compatible with 4 to12 inch wafers by changing the fixture
Minimize the foot space in the clean room
Specification / model | Cleaner 412S | Cleaner 412R | Cleaner 426L | Cleaner 812L |
Cleaning station | Single chamber single station | Index 4 stations | In-line type 6 stations | In-line type 6 stations |
Loading and unloading | Manual | Manual | Manual | Fully automatic |
Wafer size | 4 to 12 inch | 4 to 12 inch | 4 to 6 inch | 8 to 12 inch |
Rinsing (pre-cleaning) | DIW rinsing | DIW rinsing | DIW rinsing | DIW rinsing |
Brushing mechanism | 2 PVA brushes, double-side brushing | 2 PVA brushes, double-side brushing | 2 PVA brushes, double-side brushing | 2 PVA brushes, double-side brushing |
PVA brush rotation | 30- 200rpm | 30- 200rpm | 30- 300rpm | 30- 300rpm |
PVA brush gap | Adjustable | Adjustable | Adjustable | Adjustable |
Megasonic cleaning | Optional | Optional | Optional | Optional |
N2 blow drying | Available | Available | Available | Available |
High speed spin-drying | Max 2000rpm | Max 2500rpm | Max 2000rpm | Max 2000rpm |
Control System | PLC | PLC | PC | PC |